CFD Chemical Replenishing Pump

 

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Max. Discharge Capacity:1.0 ml/shot

CFD Chemical Replenishing Pump

Resolution up to 1.0 mL/shot offers finer flow adjustment

 

The resolution of the CFD-1T-B has been greatly improved compared to our existing models. The minimum flow of 1mL/shot offers greater accuracy in chemical condensation control that is required in the wafer cleaning process. The CFD-1T-B always feeds the correct quantity of chemical without overshoot, eliminating excess liquid wastage. In addition, the anti-siphon mechanism prevents unintentional siphoning.

 

Dimensions
Instruction Manual
Catalog

   
Features
 
  • Capable of 1% repeatability leading to the efficient use of chemistry and fast replenishment without over-shooting the target.

  • PTFE and PFA wetted parts ensure process purity, as does an integral leak detection sensor.

  • Integration with existing process controllers is simple.

  • Design includes optical position sensor and integral leak sensor.

  • Suction and discharge ball check valves reduce the number of fittings associated with external valving and make installation easy.
Specifications
  APPLICATION CHEMICAL REPLENSIHING
PUMP SPECIFICATION
Discharge Capacity
1 mL/shot
Max. Discharge Pressure
0.05 MPa
Liquid temperature range
20-60°C
Max Stroke speed
30 SPM
Max supply air pressure
0.15 - 0.3 MPa
Max air consumption
2.5 NL/min
Wet end materials
PTFE, PFA, PCTFE
Liquid port bore
1/4" PFA tube (6.35 x 4.35)
Supply air port bore
Rc 1/8
Weight
1.1 kg
PHOTOSENSOR SPECIFICATION
Model
Transmission type micro-photo sensor
Power voltage
5 - 24 VDC ± 10%
Output mode
NPN transistor open collector
Allowable current
50 mA or below
Cord
5m PVC 4-core cable w/0.5 round terminal